Open Access<title>High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography</title>
Author(s) -
Marco Wedowski,
J. H. Underwood,
Eric M. Gullikson,
S. Bajt,
James A. Folta,
Patrick A. Kearney,
Claude Montcalm,
Eberhard Spiller
Publication year - 2000
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.390107
Subject(s) - reflectometry , extreme ultraviolet lithography , optics , materials science , optical coating , extreme ultraviolet , metrology , lithography , photolithography , x ray optics , wavelength , optoelectronics , anti reflective coating , coating , physics , nanotechnology , computer science , laser , time domain , x ray , computer vision
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