Open Access<title>Extreme ultraviolet lithography: reflective mask technology</title>
Author(s) -
Christopher Walton,
Patrick A. Kearney,
Paul B. Mirkarimi,
J. Bowers,
C. Cerjan,
A. Warrick,
K. Wilhelmsen,
Eric Fought,
C.E. Moore,
Cindy Larson,
Sherry L. Baker,
Scott C. Burkhart,
Scott D. Hector
Publication year - 2000
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.390088
Subject(s) - materials science , extreme ultraviolet lithography , sputtering , lithography , substrate (aquarium) , scanner , optics , optoelectronics , coating , deposition (geology) , ion beam , beam (structure) , nanotechnology , thin film , physics , paleontology , sediment , biology , oceanography , geology
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