Open AccessHigh-laser-damage-threshold HfO 2 /SiO 2 mirrors manufactured by sputtering process
Author(s) -
Anne Fornier,
D. Bernardino,
Odile Lam,
Jérôme Néauport,
Francois Dufour,
B. Schmitt,
Jean-Marie Mackowski
Publication year - 1999
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.354213
Subject(s) - laser , materials science , sputtering , optoelectronics , process (computing) , optics , computer science , thin film , nanotechnology , physics , operating system
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