Open AccessLow-defect reflective mask blanks for extreme ultraviolet lithography
Author(s) -
Scott C. Burkhart,
C. Cerjan,
Patrick A. Kearney,
Paul B. Mirkarimi,
Christopher Walton,
Avijit K. Ray-Chaudhuri
Publication year - 1999
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.351130
Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , lithography , materials science , wafer , optics , optoelectronics , resist , fabrication , photolithography , x ray lithography , next generation lithography , laser , electron beam lithography , nanotechnology , physics , medicine , alternative medicine , layer (electronics) , pathology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom