Scaling behavior in interference lithography | Zendy

Rodney R. Agayan | Zendy; W. C. Banyai | Zendy; A. Fernandez | Zendy

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Scaling behavior in interference lithography

Author(s) -

Rodney R. Agayan,

W. C. Banyai,

A. Fernandez

Publication year - 1998

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - Uncategorized

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.309630

Subject(s) - resist , lithography , interference lithography , interference (communication) , immersion lithography , extreme ultraviolet lithography , materials science , scaling , multiple patterning , optics , next generation lithography , photolithography , ranging , wavelength , optoelectronics , critical dimension , x ray lithography , nanotechnology , electron beam lithography , computer science , physics , fabrication , telecommunications , medicine , channel (broadcasting) , alternative medicine , geometry , mathematics , layer (electronics) , pathology

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