Open Access<title>Thermal management of masks for deep x-ray lithography</title>
Author(s) -
Ali M. Khounsary,
David Chojnowski,
Derrick C. Mancini,
Barry Lai,
Roger J. Dejus
Publication year - 1997
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.294468
Subject(s) - x ray lithography , materials science , lithography , optics , resist , diamond , thermal radiation , optoelectronics , photoresist , substrate (aquarium) , extreme ultraviolet lithography , composite material , physics , layer (electronics) , thermodynamics , geology , oceanography
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