Performance of the VUV high-resolution and high-flux beamline for chemical dynamics studies at the Advanced Light Source | Zendy

Philip Heimann | Zendy; Masato Koike | Zendy; Chia Wei Hsu | Zendy; Matt Evans | Zendy; Cheuk Yiu Ng | Zendy; Deanna Hildebrand | Zendy; Xueming Yang | Zendy; C. Flaim | Zendy; Arthur G. Suits | Zendy; Yuan T. Lee | Zendy

Open Access

<title>Performance of the VUV high-resolution and high-flux beamline for chemical dynamics studies at the Advanced Light Source</title>

Author(s) -

Philip Heimann,

Masato Koike,

Chia Wei Hsu,

Matt Evans,

Cheuk Yiu Ng,

Deanna Hildebrand,

Xueming Yang,

C. Flaim,

Arthur G. Suits,

Yuan T. Lee

Publication year - 1996

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.259853

Subject(s) - monochromator , undulator , beamline , optics , physics , synchrotron radiation , photon flux , advanced photon source , radiation , grating , photoionization , photon , photon energy , flux (metallurgy) , atomic physics , ionization , beam (structure) , materials science , wavelength , ion , quantum mechanics , metallurgy

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