Roughness measurement of 2D curvilinear patterns: challenges and advanced methodology | Zendy

Jonathan Pradelles | Zendy; L. Perraud | Zendy; Aurélien Fay | Zendy; Élie Sezestre | Zendy; Jean-Baptiste Henry | Zendy; Jessy Bustos | Zendy; Estelle Guyez | Zendy; Sébastien Berard-Bergery | Zendy; Aurélie Le Pennec | Zendy; Mohamed Abaidi | Zendy; Jordan Belissard | Zendy; Nivea G. Schuch | Zendy; Matthieu Milléquant | Zendy; Thiago Figueiro | Zendy; Patrick Schiavone | Zendy

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Roughness measurement of 2D curvilinear patterns: challenges and advanced methodology

Author(s) -

Jonathan Pradelles,

L. Perraud,

Aurélien Fay,

Élie Sezestre,

Jean-Baptiste Henry,

Jessy Bustos,

Estelle Guyez,

Sébastien Berard-Bergery,

Aurélie Le Pennec,

Mohamed Abaidi,

Jordan Belissard,

Nivea G. Schuch,

Matthieu Milléquant,

Thiago Figueiro,

Patrick Schiavone

Publication year - 2021

Publication title -

metrology, inspection, and process control for semiconductor manufacturing xxxv

Language(s) - English

Resource type - Conference proceedings

DOI - 10.1117/12.2583843

Subject(s) - curvilinear coordinates , figure of merit , context (archaeology) , computer science , surface finish , noise (video) , lithography , measure (data warehouse) , computer vision , artificial intelligence , optics , algorithm , materials science , mathematics , image (mathematics) , physics , geometry , data mining , paleontology , composite material , biology

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