Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications | Zendy

Xavier Chevalier | Zendy; Cindy Gomez Correia | Zendy; Gwenaelle Pound-Lana | Zendy; Philippe Bézard | Zendy; Matthieu Sérégé | Zendy; Camille PetitEtienne | Zendy; Guillaume Gay | Zendy; Gilles Cunge | Zendy; Benjamin CabannesBoué | Zendy; Célia Nicolet | Zendy; Christophe Navarro | Zendy; Ian Cayrefourcq | Zendy; Marcus Müller | Zendy; Georges Hadziioannou | Zendy; Ilias Iliopoulos | Zendy; Guillaume Fleury | Zendy; Marc Zelsmann | Zendy

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Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

Author(s) -

Xavier Chevalier,

Cindy Gomez Correia,

Gwenaelle Pound-Lana,

Philippe Bézard,

Matthieu Sérégé,

Camille PetitEtienne,

Guillaume Gay,

Gilles Cunge,

Benjamin CabannesBoué,

Célia Nicolet,

Christophe Navarro,

Ian Cayrefourcq,

Marcus Müller,

Georges Hadziioannou,

Ilias Iliopoulos,

Guillaume Fleury,

Marc Zelsmann

Publication year - 2021

Publication title -

hal (le centre pour la communication scientifique directe)

Language(s) - English

Resource type - Conference proceedings

DOI - 10.1117/12.2583717

Subject(s) - lithography , materials science , copolymer , silicon , stack (abstract data type) , lamellar structure , nanotechnology , nano , self assembly , scalability , planarity testing , block (permutation group theory) , optoelectronics , polymer , computer science , composite material , chemistry , geometry , mathematics , database , crystallography , programming language

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