Scalable and consistent fabrication of plasmonic colors via nanoimprint lithography | Zendy

Muhammad Faris Shahin Shahidan | Zendy; Jingchao Song | Zendy; Timothy D. James | Zendy; Paul Mulvaney | Zendy; Ann Roberts | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Scalable and consistent fabrication of plasmonic colors via nanoimprint lithography

Author(s) -

Muhammad Faris Shahin Shahidan,

Jingchao Song,

Timothy D. James,

Paul Mulvaney,

Ann Roberts

Publication year - 2019

Publication title -

spie micro+nano materials, devices, and applications

Language(s) - English

Resource type - Conference proceedings

DOI - 10.1117/12.2539079

Subject(s) - nanoimprint lithography , plasmon , fabrication , gamut , materials science , lithography , optoelectronics , thermal , scalability , nanolithography , next generation lithography , resist , nanotechnology , optics , electron beam lithography , computer science , physics , medicine , alternative medicine , pathology , layer (electronics) , database , meteorology

We utilised thermal and UV-assisted Nanoimprint Lithography (NIL) i.e. thermal and UV-assisted to produce plasmonic coloration, and compare their ability for scalable fabrication. Several designs are presented and we show the generated colors are dependent on their geometry and the direction of polarisation of incident illumination. Finally, we demonstrated UV-NIL for consistent production of large-area (0.6×0.4 cm2) plasmonic color with extended color gamut.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research