Open AccessAchieving diffraction-limited performance on the Berkeley MET5
Author(s) -
Ryan Miyakawa,
Christopher N. Anderson,
Wenhua Zhu,
Geoff Gaines,
Jeff Gamsby,
C. Cork,
Gideon Jones,
M. J. Dickenson,
Seno Rekawa,
Weilun Chao,
Sharon Oh,
Patrick Naulleau
Publication year - 2019
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1117/12.2516384
Subject(s) - interferometry , extreme ultraviolet lithography , wavefront , optics , lithography , diffraction , adaptive optics , physics , materials science , computer science
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