Open AccessOverview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab
Author(s) -
Christopher N. Anderson,
Arnaud Allézy,
Weilun Chao,
C. Cork,
Will Cork,
Rene Delano,
Jason DePonte,
Michael R. Dickinson,
Geoff Gaines,
Jeff Gamsby,
Eric M. Gullikson,
Gideon Jones,
Stephen T. Meyers,
Ryan Miyakawa,
Patrick Naulleau,
Senajith Rekawa,
Farhad Salmassi,
Brandon Vollmer,
Daniel Zehm,
Wenhua Zhu
Publication year - 2019
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1117/12.2516339
Subject(s) - extreme ultraviolet lithography , beamline , optics , extreme ultraviolet , physics , synchrotron , wafer , resolution (logic) , focus (optics) , critical dimension , optoelectronics , computer science , laser , beam (structure) , artificial intelligence
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