Open AccessBeamline and exposure station for deep x-ray lithography at the advanced photon source
Author(s) -
Barry Lai,
Derrick C. Mancini,
Wenbing Yun,
E. Gluskin
Publication year - 1996
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.250948
Subject(s) - beamline , collimated light , optics , synchrotron radiation , x ray lithography , resist , beam (structure) , lithography , materials science , x ray , physics , synchrotron , scanner , high energy x rays , synchrotron light source , advanced photon source , synchrotron radiation source , storage ring , laser , nanotechnology , layer (electronics)
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