Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity | Zendy

Morten Steinecke | Zendy; Tarik Kellermann | Zendy; Marco Jupé | Zendy; Lars Jensen | Zendy; Detlev Ristau | Zendy

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Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity

Author(s) -

Morten Steinecke,

Tarik Kellermann,

Marco Jupé,

Lars Jensen,

Detlev Ristau

Publication year - 2018

Publication title -

institutional repository of leibniz universität hannover (leibniz universität hannover)

Language(s) - English

Resource type - Conference proceedings

DOI - 10.1117/12.2500341

Subject(s) - refractive index , materials science , dielectric , optics , nonlinear system , indium tin oxide , interferometry , nonlinear optics , thin film , optoelectronics , laser , nanotechnology , physics , quantum mechanics

The exploitation of nonlinear effects in multi-layer thin films allows for optics with novel functions, such as all- optical switching and frequency conversion. In this contribution, an improved interferometric setup for the measurement of the nonlinear refractive index in dielectric substrates and deposited single layers is presented. The setup is based on the wave front deformation caused by the self-focusing in the measured samples. Additionally, measurement results for a highly nonlinear material, indium-tin-oxide (ITO) are presented with respect to the materials power handling capabilities and compared to values from other materials.

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