Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography | Zendy

JeanLouis Leclercq | Zendy; Olivier Soppera | Zendy; Mathieu Caillau | Zendy; Céline Chevalier | Zendy; Pierre Crémillieu | Zendy; Thierry Delair | Zendy; Emmanuelle Laurenceau | Zendy; Yann Chevolot | Zendy; Benjamin Leuschel | Zendy; Cédric Ray | Zendy; Christophe Moulin | Zendy; Christian Jonin | Zendy; Emmanuel Bénichou | Zendy; Pierre-François Brevet | Zendy; Christelle Yeromonahos | Zendy

Open Access

Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography

Author(s) -

JeanLouis Leclercq,

Olivier Soppera,

Mathieu Caillau,

Céline Chevalier,

Pierre Crémillieu,

Thierry Delair,

Emmanuelle Laurenceau,

Yann Chevolot,

Benjamin Leuschel,

Cédric Ray,

Christophe Moulin,

Christian Jonin,

Emmanuel Bénichou,

Pierre-François Brevet,

Christelle Yeromonahos

Publication year - 2018

Publication title -

hal (le centre pour la communication scientifique directe)

Language(s) - English

Resource type - Conference proceedings

DOI - 10.1117/12.2292312

Subject(s) - resist , lithography , chitosan , materials science , electron beam lithography , photoresist , etching (microfabrication) , nanotechnology , immersion lithography , plasma etching , extreme ultraviolet lithography , x ray lithography , environmentally friendly , chemical engineering , optoelectronics , layer (electronics) , engineering , biology , ecology

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