Open AccessCNT EUV pellicle: moving towards a full-size solution
Author(s) -
Johan Meersschaut,
Olivier Richard,
Marina Y. Timmermans,
Ivan Pollentier,
Jae Uk Lee,
Christoph Adelmann,
Cedric Huyghebaert,
Emily Gallagher
Publication year - 2017
Publication title -
lirias (ku leuven)
Language(s) - Uncategorized
Resource type - Conference proceedings
DOI - 10.1117/12.2280632
Subject(s) - extreme ultraviolet lithography , reticle , materials science , carbon nanotube , extreme ultraviolet , coating , optics , optoelectronics , nanotechnology , laser , physics , wafer
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