Open AccessFabrication of polymer based integrated photonic devices by maskless lithography
Author(s) -
Maik Rahlves
Publication year - 2016
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.2213211
Subject(s) - fabrication , maskless lithography , lithography , photonics , materials science , photolithography , interferometry , next generation lithography , optoelectronics , electron beam lithography , nanotechnology , optics , resist , physics , medicine , alternative medicine , pathology , layer (electronics)
We present our recent results on the fabrication of photonic devices such as single-mode and few-mode waveguides, Ycouplers as well as integrated interferometric sensor devices. The devices were created by means of a fabrication method based on maskless lithography, which allows for fabricating embedded integrated polymer elements on a scale of several square centimeters with a resolution down to one micron. We demonstrate the versatility of our approach by presenting first results on photonic structures created by maskless lithography. © 2016 SPIE
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