Open AccessMultiple scale modeling of Al2O3thin film growth in an ion beam sputtering process
Author(s) -
Marcus Turowski,
Marco Jupé,
Thomas Melzig,
Andreas Pflug,
Detlev Ristau
Publication year - 2015
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.2191049
Subject(s) - sputtering , materials science , thin film , coating , layer (electronics) , substrate (aquarium) , ion beam , characterization (materials science) , process (computing) , beam (structure) , optoelectronics , optics , composite material , nanotechnology , computer science , physics , oceanography , geology , operating system
A multiple scale model approach is presented in order to investigate Al2O3 thin film growth in the framework of an existing Ion Beam Sputtering (IBS) coating process. Therefore, several simulation techniques are combined via optimized interfaces for realizing the concept of a virtual coater. Characteristic coating process parameters of the IBS coating plant are applied as input parameters to model the material transport in the chamber, the energy and angular distribution of the coating material at the substrate, the formation of structural thin film properties, and the optical as well as the electronic layer properties. The resulting thin film properties are validated to the data of an experimental IBS Al2O3 single layer prepared applying the underlying coating facility. The comparison accounts for a good agreement between the modeled layer properties using the virtual coater concept and the experimental characterization data
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom