Measuring skew in average surface roughness as a function of surface preparation | Zendy

Mark T. Stahl | Zendy

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Measuring skew in average surface roughness as a function of surface preparation

Author(s) -

Mark T. Stahl

Publication year - 2015

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.2187535

Subject(s) - polishing , surface roughness , skew , white light interferometry , surface finish , interferometry , optics , materials science , surface (topology) , computer science , physics , mathematics , geometry , composite material , telecommunications

Characterizing surface roughness is important for predicting optical performance. Better measurement of surface roughness reduces polishing time, saves money and allows the science requirements to be better defined. This study characterized statistics of average surface roughness as a function of polishing time. Average surface roughness was measured at 81 locations using a Zygo® white light interferometer at regular intervals during the polishing process. Each data set was fit to a normal and Largest Extreme Value (LEV) distribution; then tested for goodness of fit. We show that the skew in the average data changes as a function of polishing time.

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