Open AccessConfocal Raman spectroscopy and AFM for evaluation of sidewalls in type II superlattice FPAs
Author(s) -
Thomas J. Rotter,
Tito Busani,
Pankaj Rathi,
Felix T. Jaeckel,
P. A. Reyes,
Kevin J. Malloy,
A. A. Ukhanov,
E. Plis,
Sanjay Krishna,
M. Jaime-Vasquez,
Neil F. Baril,
J. D. Benson,
D. A. Ténné
Publication year - 2015
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.2178162
Subject(s) - raman spectroscopy , materials science , confocal , superlattice , spectroscopy , optoelectronics , atomic force microscopy , confocal microscopy , optics , nanotechnology , physics , quantum mechanics
We propose to utilize confocal Raman spectroscopy combined with high resolution atomic force microscopy (AFM) for nondestructive characterisation of the sidewalls of etched and passivated small pixel (24 μm×24 μm) focal plane arrays (FPA) fabricated using LW/LWIR InAs/GaSb type-II strained layer superlattice (T2SL) detector material. Special high aspect ratio Si and GaAs AFM probes, with tip length of 13 μm and tip aperture less than 7°, allow characterisation of the sidewall morphology. Confocal microscopy enables imaging of the sidewall profile through optical sectioning. Raman spectra measured on etched T2SL FPA single pixels enable us to quantify the non-uniformity of the mesa delineation process.
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