Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach | Zendy

Emmanuel Dupuy | Zendy; E. Pargon | Zendy; Marc Fouchier | Zendy; H. Grampeix | Zendy; Jonathan Pradelles | Zendy; Maxime Dar | Zendy; Patricia PimentaBarros | Zendy; S. Barnola | Zendy; O. Joubert | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach

Author(s) -

Emmanuel Dupuy,

E. Pargon,

Marc Fouchier,

H. Grampeix,

Jonathan Pradelles,

Maxime Dar,

Patricia PimentaBarros,

S. Barnola,

O. Joubert

Publication year - 2015

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.2085812

Subject(s) - materials science , multiple patterning , photoresist , resist , surface finish , surface roughness , optics , silicon , critical dimension , optoelectronics , line (geometry) , enhanced data rates for gsm evolution , computer science , physics , nanotechnology , telecommunications , composite material , geometry , mathematics , layer (electronics)

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research