Assessment of carbon layer growth induced by resists outgassing in multi e-beams lithography | Zendy

JC Marusic | Zendy; M-L Pourteau | Zendy; Sylviane Cêtre | Zendy; L. Pain | Zendy; A-P. Mebiene-Engohang | Zendy; Sylvain David | Zendy; S. Labau | Zendy; J. Boussey | Zendy

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Assessment of carbon layer growth induced by resists outgassing in multi e-beams lithography

Author(s) -

JC Marusic,

M-L Pourteau,

Sylviane Cêtre,

L. Pain,

A-P. Mebiene-Engohang,

Sylvain David,

S. Labau,

J. Boussey

Publication year - 2014

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.2066152

Subject(s) - outgassing , resist , extreme ultraviolet lithography , wafer , lithography , residual gas analyzer , materials science , electron beam lithography , layer (electronics) , photolithography , extreme ultraviolet , contamination , stencil lithography , optoelectronics , optics , nanotechnology , chemistry , mass spectrometry , chromatography , physics , ecology , laser , organic chemistry , biology

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