Open Access<title>Interferometric phase shift technique for high-resolution deep-UV microlithography</title>
Author(s) -
Frank K. Tittel,
Joseph R. Cavallaro,
Motoi Kido,
Michael C. Smayling,
Gábor Szabó,
William L. Wilson
Publication year - 1995
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.204981
Subject(s) - photoresist , interferometry , lithography , optics , photolithography , materials science , wavelength , optoelectronics , feature (linguistics) , phase (matter) , layer (electronics) , physics , nanotechnology , quantum mechanics , linguistics , philosophy
A new phase shifting technique based on interferometry has been developed which is especially suited for deep-UV microlithography. Using only a single layer chromium mask, with no additional phase shift elements, significant resolution and contrast enhancement over conventional transmission lithography can be achieved. Both computer simulations, as well as experiments using a CCD camera and UV photoresist confirm the capabilities of this new approach. Using a relatively simple experimental setup and an illumination wavelength of 355 nm, lines with feature sizes as find as 0.3 um were achieved
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom