Open AccessInvestigating extremely low resistance ohmic contacts to silicon carbide using a novel test structure
Author(s) -
Yue Pan,
Aaron M. Collins,
Fahid Algahtani,
Patrick W. Leech,
Geoffrey K. Reeves,
Philip Tanner,
Anthony S. Holland
Publication year - 2013
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.2033910
Subject(s) - ohmic contact , silicon carbide , materials science , contact resistance , doping , electrical resistivity and conductivity , silicon , optoelectronics , carbide , electronic engineering , metallurgy , composite material , electrical engineering , engineering , layer (electronics)
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