Open AccessScaling-down lithographic dimensions with block-copolymer materials: 10nmsized features with PS-b-PMMA
Author(s) -
Xavier Chevalier,
C. Nicolet,
Raluca Tiron,
A. Gharbi,
Maxime Argoud,
Jonathan Pradelles,
Michaël Delalande,
Gilles Cunge,
Guillaume Fleury,
Georges Hadziioannou,
Christophe Navarro
Publication year - 2013
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.2011405
Subject(s) - lithography , microelectronics , materials science , polymer , copolymer , etching (microfabrication) , scaling , nanotechnology , dry etching , thin film , self assembly , optoelectronics , composite material , layer (electronics) , geometry , mathematics
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