Best focus shift mitigation for extending the depth of focus | Zendy

A. Szücs | Zendy; Jonathan Planchot | Zendy; Vincent Farys | Zendy; Emek Yesilada | Zendy; C. Alleaume | Zendy; L. Depré | Zendy; Robert Dover | Zendy; C. Gourgon | Zendy; M. Besacier | Zendy; Angelique Nachtwein | Zendy; P. Rusu | Zendy

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Best focus shift mitigation for extending the depth of focus

Author(s) -

A. Szücs,

Jonathan Planchot,

Vincent Farys,

Emek Yesilada,

C. Alleaume,

L. Depré,

Robert Dover,

C. Gourgon,

M. Besacier,

Angelique Nachtwein,

P. Rusu

Publication year - 2013

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.2011114

Subject(s) - focus (optics) , stepper , wavefront , depth of focus (tectonics) , immersion lithography , computer science , usable , lithography , scanner , optics , reticle , photomask , photolithography , resist , wafer , artificial intelligence , physics , materials science , optoelectronics , nanotechnology , geology , paleontology , layer (electronics) , world wide web , subduction , tectonics

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