Run-to-run control framework for VLSI manufacturing | Zendy

James Moyne | Zendy; H. Etemad | Zendy; M.E. Elta | Zendy

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Run-to-run control framework for VLSI manufacturing

Author(s) -

James Moyne,

H. Etemad,

M.E. Elta

Publication year - 1994

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.167358

Subject(s) - process (computing) , controller (irrigation) , process control , component (thermodynamics) , control (management) , supervisory control , computer science , embedded system , control engineering , control system , control flow , software , engineering , operating system , electrical engineering , physics , thermodynamics , artificial intelligence , agronomy , biology , programming language

A run-to-run (R2R) control framework has been developed for application to supervisory control of semiconductor manufacturing processes. This generic framework, which is being developed for eventual transfer to industry, is one component of a multi-level control system that includes real-time equipment and process control as well as pseudo-real-time process control elements operating in conjunction with the R2R controller. The framework is compliant with existing trends and standards in industry. At the heart of the framework is a generic cell controller implementation that serves to support the R2R control algorithm and coordinate control and information flow between the various R2R control modules. This implementation provides for the easy incorporation of commercially available software into the control scheme.

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