Open AccessErrata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
Author(s) -
Philip C. W. Ng
Publication year - 2011
Publication title -
journal of micro/nanolithography mems and moems
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.394
H-Index - 42
eISSN - 1932-5134
pISSN - 1932-5150
DOI - 10.1117/1.3576188
Subject(s) - metrology , electronics , computer science , core (optical fiber) , extreme ultraviolet , nanotechnology , ultraviolet , materials science , optoelectronics , engineering , optics , physics , electrical engineering , telecommunications , laser
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