Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method
Author(s) -
Yen-Min Lee,
JiaHan Li,
Philip C. W. Ng,
Ting-Hang Pei,
Fu-Min Wang,
Kuen-Yu Tsai,
Alek C. Chen
Publication year - 2010
Publication title -
journal of micro/nanolithography mems and moems
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.394
H-Index - 42
eISSN - 1932-5134
pISSN - 1932-5150
DOI - 10.1117/1.3503532
Subject(s) - finite difference time domain method , extreme ultraviolet , optics , computation , materials science , refractive index , wavelength , transmission line , scattering , extreme ultraviolet lithography , time domain , root mean square , computational physics , perfectly matched layer , transmission (telecommunications) , physics , mathematics , computer science , algorithm , telecommunications , laser , quantum mechanics , computer vision
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