Open AccessNonionic photoacid generator behavior under high-energy exposure sources
Author(s) -
Richard A. Lawson
Publication year - 2009
Publication title -
journal of micro/nanolithography mems and moems
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.394
H-Index - 42
eISSN - 1932-5134
pISSN - 1932-5150
DOI - 10.1117/1.3259205
Subject(s) - chemistry , absorbance , onium , photochemistry , analytical chemistry (journal) , organic chemistry , chromatography , ion
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