Laser interference as a lithographic nanopatterning tool | Zendy

C.J.M. van Rijn | Zendy

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Laser interference as a lithographic nanopatterning tool

Author(s) -

C.J.M. van Rijn

Publication year - 2006

Publication title -

journal of micro/nanolithography mems and moems

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.394

H-Index - 42

eISSN - 1932-5134

pISSN - 1932-5150

DOI - 10.1117/1.2173269

Subject(s) - materials science , lithography , laser , interference (communication) , interference lithography , nanotechnology , optoelectronics , optics , computer science , physics , telecommunications , fabrication , medicine , channel (broadcasting) , alternative medicine , pathology

Laser interference lithography is reviewed as an adequate nanopatterning tool for devices with periodic structures. The structure size may practically be chosen in the range between 100 nm and 10.0 m by adjusting the angle of incidence of the incoming laser beam. The exposure method is fast, inexpensive, and applicable for large areas. The method may be used to fabricate microsieves, shadow masks, calibration grids, and photonic crystals. © 2006 Society of Photo-Optical

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