Photoacoustic investigation of intrinsic and extrinsic Si
Author(s) -
Sajan D. George
Publication year - 2004
Publication title -
optical engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.357
H-Index - 105
eISSN - 1560-2303
pISSN - 0091-3286
DOI - 10.1117/1.1814357
Subject(s) - thermal diffusivity , materials science , dopant , semiconductor , phonon , doping , scattering , phonon scattering , transmission coefficient , thermal , diffusion , optoelectronics , silicon , optics , thermal conductivity , transmission (telecommunications) , condensed matter physics , thermodynamics , composite material , physics , electrical engineering , engineering
An open-cell configuration of the photoacoustic (PA) technique is employed to determine the thermal and transport properties of intrinsic Si and Si doped with B ( p -type) and P ( n -type). The experimentally obtained phase of the PA signal under heat transmission configuration is fitted to that of theoretical model by taking thermal and transport properties, namely, thermal diffusivity, diffusion coefficient, and surface recombination velocity, as adjustable parameters. It is seen from the analysis that doping and also the nature of dopant have a strong influence on the thermal and transport properties of semiconductors. The results are interpreted in terms of the carrier-assisted and phonon-assisted heat transfer mechanisms in semiconductors as well as the various scattering processes occurring in the propagation of heat carriers.
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