Open AccessErratum: ‘‘Hollow cathode enhanced capacitively coupled plasmas in Ar/N2/H2 mixtures and implications for plasma enhanced ALD” [J. Vac. Sci. Technol. B 40, 044002 (2022)]
Author(s) -
David R. Boris,
Michael J. Johnson,
Charles R. Eddy,
Scott G. Walton
Publication year - 2022
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0002172
Subject(s) - materials science , plasma , cathode , capacitively coupled plasma , atomic physics , nanotechnology , optoelectronics , inductively coupled plasma , chemistry , physics , nuclear physics
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