Open AccessSimple thermal vapor deposition process for and characterization of n-type indium oxysulfide thin films
Author(s) -
Ashwin Jayaraman,
Sang Bok Kim,
Luke M. Davis,
Xiabing Lou,
Xizhu Zhao,
Roy G. Gordon
Publication year - 2022
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0001997
Subject(s) - indium , thin film , x ray photoelectron spectroscopy , band gap , amorphous solid , rutherford backscattering spectrometry , sulfide , sulfur , analytical chemistry (journal) , chemical vapor deposition , materials science , deposition (geology) , chalcogenide , chemistry , chemical engineering , nanotechnology , optoelectronics , metallurgy , crystallography , organic chemistry , paleontology , sediment , engineering , biology