Open AccessCombined ultraviolet- and electron-beam lithography with Micro-Resist-Technology GmbH ma-N1400 resist
Author(s) -
David J. Thoen,
Vignesh Murugesan,
Alejandro Pascual Laguna,
K. Karatsu,
Akira Endo,
J. J. A. Baselmans
Publication year - 2022
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0001918
Subject(s) - resist , materials science , electron beam lithography , lithography , optoelectronics , next generation lithography , fabrication , etching (microfabrication) , optics , photolithography , nanolithography , layer (electronics) , nanotechnology , medicine , alternative medicine , physics , pathology
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