Open AccessAtomically precise deposition of (Er0.1Y0.9)2SiO5 combined with digitally processed DC sputtering and non-radical oxidation
Author(s) -
Ghent Nakamura,
Hideo Isshiki
Publication year - 2022
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0001917
Subject(s) - photoluminescence , materials science , crystallinity , sputtering , crystallization , deposition (geology) , layer (electronics) , epitaxy , optoelectronics , monoclinic crystal system , thin film , photonics , chemical engineering , nanotechnology , crystallography , chemistry , crystal structure , composite material , geology , sediment , engineering , paleontology
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