Open AccessHigh synergy atomic layer etching of AlGaN/GaN with HBr and Ar
Author(s) -
Kevin G. Crawford,
James Grant,
Dilini Hemakumara,
Xu Li,
Iain Thayne,
David A. J. Moran
Publication year - 2022
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0001862
Subject(s) - etching (microfabrication) , layer (electronics) , materials science , optoelectronics , transistor , reactivity (psychology) , dry etching , wide bandgap semiconductor , nanotechnology , voltage , electrical engineering , medicine , alternative medicine , engineering , pathology
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