Open AccessSimplified CVD route to near-zero thickness silicon nitride films
Author(s) -
Barry Arkles,
Chad Brick,
Jonathan Goff,
Alain E. Kaloyeros
Publication year - 2022
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0001820
Subject(s) - x ray photoelectron spectroscopy , materials science , chemical vapor deposition , silicon nitride , ellipsometry , analytical chemistry (journal) , silicon , substrate (aquarium) , thin film , silicon oxide , plasma enhanced chemical vapor deposition , nanotechnology , optoelectronics , chemistry , chemical engineering , oceanography , chromatography , geology , engineering
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