Open AccessReaction mechanism studies on atomic layer deposition process of AlF3
Author(s) -
Heta-Elisa Nieminen,
Mikko Ritala
Publication year - 2022
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0001624
Subject(s) - atomic layer deposition , quartz crystal microbalance , quadrupole mass analyzer , deposition (geology) , layer (electronics) , metal , thin film , materials science , quadrupole , mass spectrometry , chemistry , chemical engineering , analytical chemistry (journal) , inorganic chemistry , nanotechnology , metallurgy , environmental chemistry , adsorption , atomic physics , chromatography , geology , engineering , paleontology , physics , sediment
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