Open AccessErratum: “Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma” [J. Vac. Sci. Technol. A 38, 022412 (2020)]
Author(s) -
Fumikazu Mizutani,
Shintaro Higashi,
Mari Inoue,
Toshihide Nabatame
Publication year - 2021
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0001493
Subject(s) - gallium , layer (electronics) , atomic layer deposition , deposition (geology) , plasma , materials science , analytical chemistry (journal) , chemistry , nanotechnology , metallurgy , environmental chemistry , physics , nuclear physics , geology , paleontology , sediment
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