Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma | Zendy

Ali Mahmoodinezhad | Zendy; Carlos Morales | Zendy; Franziska Naumann | Zendy; Paul Plate | Zendy; Robert G. Meyer | Zendy; C. Janowitz | Zendy; Karsten Henkel | Zendy; Małgorzata Kot | Zendy; Marvin Hartwig Zoellner | Zendy; Christian Wenger | Zendy; Jan Ingo Flege | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma

Author(s) -

Ali Mahmoodinezhad,

Carlos Morales,

Franziska Naumann,

Paul Plate,

Robert G. Meyer,

C. Janowitz,

Karsten Henkel,

Małgorzata Kot,

Marvin Hartwig Zoellner,

Christian Wenger,

Jan Ingo Flege

Publication year - 2021

Publication title -

journal of vacuum science and technology a vacuum surfaces and films

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.583

H-Index - 112

eISSN - 1520-8559

pISSN - 0734-2101

DOI - 10.1116/6.0001375

Subject(s) - x ray photoelectron spectroscopy , trimethylindium , materials science , thin film , analytical chemistry (journal) , atomic layer deposition , indium , ellipsometry , substrate (aquarium) , band gap , layer (electronics) , chemistry , nanotechnology , chemical engineering , optoelectronics , metalorganic vapour phase epitaxy , epitaxy , oceanography , chromatography , geology , engineering

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research