Open AccessHybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint
Author(s) -
Sijia Xie,
Jan Erjawetz,
Christine Schuster,
Helmut Schift
Publication year - 2021
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0001206
Subject(s) - nanoimprint lithography , materials science , grayscale , resist , lithography , photoresist , next generation lithography , maskless lithography , optics , nanotechnology , optoelectronics , electron beam lithography , fabrication , medicine , physics , pixel , alternative medicine , pathology , layer (electronics)
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