Kinetics of the low-pressure chemical vapor deposited tungsten nitride process using tungsten hexafluoride and ammonia precursors | Zendy

Johan Gerdin Hulkko | Zendy; Katalin Böőr | Zendy; Ren Qiu | Zendy; Olof Bäcke | Zendy; Mats Boman | Zendy; M. Halvarsson | Zendy; Erik Lindahl | Zendy

Open Access

Kinetics of the low-pressure chemical vapor deposited tungsten nitride process using tungsten hexafluoride and ammonia precursors

Author(s) -

Johan Gerdin Hulkko,

Katalin Böőr,

Ren Qiu,

Olof Bäcke,

Mats Boman,

M. Halvarsson,

Erik Lindahl

Publication year - 2021

Publication title -

journal of vacuum science and technology a vacuum surfaces and films

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.583

H-Index - 112

eISSN - 1520-8559

pISSN - 0734-2101

DOI - 10.1116/6.0001093

Subject(s) - tungsten , microstructure , chemical vapor deposition , amorphous solid , materials science , transmission electron microscopy , nitride , partial pressure , analytical chemistry (journal) , electron diffraction , oxygen , chemical engineering , chemistry , crystallography , composite material , layer (electronics) , metallurgy , diffraction , nanotechnology , optics , physics , organic chemistry , engineering , chromatography

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