Errata: ‘‘Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing’’ [J. Vac. Sci. Technol. A 38, 042603 (2020)] | Zendy

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Errata: ‘‘Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing’’ [J. Vac. Sci. Technol. A 38, 042603 (2020)]

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