Open AccessErrata: ‘‘Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing’’ [J. Vac. Sci. Technol. A 38, 042603 (2020)]
Author(s) -
Xia Sang,
Ernest Chen,
Jane P. Chang
Publication year - 2020
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000758
Subject(s) - layer (electronics) , materials science , lithography , extreme ultraviolet lithography , nickel , ultraviolet , optoelectronics , nanotechnology , metallurgy
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