Origin of area selective plasma enhanced chemical vapor deposition of microcrystalline silicon | Zendy

Ghewa Akiki | Zendy; Mathieu Frégnaux | Zendy; Ileana Florea | Zendy; Pavel Bulkin | Zendy; D. Daineka | Zendy; Sergej Filonovich | Zendy; Muriel Bouttemy | Zendy; Erik Johnson | Zendy

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Origin of area selective plasma enhanced chemical vapor deposition of microcrystalline silicon

Author(s) -

Ghewa Akiki,

Mathieu Frégnaux,

Ileana Florea,

Pavel Bulkin,

D. Daineka,

Sergej Filonovich,

Muriel Bouttemy,

Erik Johnson

Publication year - 2020

Publication title -

journal of vacuum science and technology a vacuum surfaces and films

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.583

H-Index - 112

eISSN - 1520-8559

pISSN - 0734-2101

DOI - 10.1116/6.0000653

Subject(s) - silicon , microcrystalline , x ray photoelectron spectroscopy , chemical vapor deposition , plasma enhanced chemical vapor deposition , materials science , analytical chemistry (journal) , deposition (geology) , plasma processing , plasma , chemical engineering , chemistry , nanotechnology , optoelectronics , crystallography , organic chemistry , paleontology , physics , quantum mechanics , sediment , engineering , biology

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