Experimental reliability study of cumulative damage models on state-of-the-art semiconductor technologies for step-stress tests and mission profile stresses
Author(s) -
A. Hirler,
Josef Biba,
D. Lipp,
H. Lochner,
M. Siddabathula,
Steven Simon,
T. Sulima,
Maciej Wiatr,
W. Hänsch
Publication year - 2020
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0000504
Subject(s) - reliability (semiconductor) , reliability engineering , stress (linguistics) , accelerated life testing , capacitor , materials science , semiconductor device , random variable , computer science , voltage , engineering , electrical engineering , statistics , mathematics , composite material , physics , weibull distribution , linguistics , power (physics) , philosophy , layer (electronics) , quantum mechanics
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