z-logo
open-access-imgOpen Access
Experimental reliability study of cumulative damage models on state-of-the-art semiconductor technologies for step-stress tests and mission profile stresses
Author(s) -
A. Hirler,
Josef Biba,
D. Lipp,
H. Lochner,
M. Siddabathula,
Steven Simon,
T. Sulima,
Maciej Wiatr,
W. Hänsch
Publication year - 2020
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0000504
Subject(s) - reliability (semiconductor) , reliability engineering , stress (linguistics) , accelerated life testing , capacitor , materials science , semiconductor device , random variable , computer science , voltage , engineering , electrical engineering , statistics , mathematics , composite material , physics , weibull distribution , linguistics , power (physics) , philosophy , layer (electronics) , quantum mechanics

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom