Open AccessVacuum ultraviolet-absorption spectroscopy and delocalized plasma-induced emission used for the species detection in a down-stream soft-etch plasma reactor
Author(s) -
Robert Soriano,
Gilles Cunge,
Nader Sadeghi
Publication year - 2020
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000134
Subject(s) - dissociation (chemistry) , plasma , delocalized electron , chemistry , torr , spectroscopy , capacitively coupled plasma , analytical chemistry (journal) , absorption spectroscopy , molecule , ultraviolet , atomic physics , photochemistry , inductively coupled plasma , materials science , optoelectronics , chromatography , thermodynamics , physics , organic chemistry , quantum mechanics
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