Open AccessGas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS
Author(s) -
Michael V. Lee,
Ghaleb A. Husseini,
Ken Sautter,
Matthew R. Linford
Publication year - 2010
Publication title -
surface science spectra
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.474
H-Index - 13
eISSN - 1520-8575
pISSN - 1055-5269
DOI - 10.1116/11.20071103
Subject(s) - silane , silanes , alkyl , x ray photoelectron spectroscopy , deposition (geology) , silicon , passivation , materials science , plasma enhanced chemical vapor deposition , chemical vapor deposition , monolayer , silicon oxide , chemical engineering , layer (electronics) , silicon dioxide , inorganic chemistry , chemistry , organic chemistry , nanotechnology , metallurgy , composite material , engineering , paleontology , silicon nitride , sediment , biology
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