Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated 3-Glycidoxypropyldimethylethoxysilane Analyzed by XPS | Zendy

Ghaleb A. Husseini | Zendy; Matthew R. Linford | Zendy; Matthew C. Asplund | Zendy; Justin G. Peacock | Zendy; Eric T. Sevy | Zendy

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Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated 3-Glycidoxypropyldimethylethoxysilane Analyzed by XPS

Author(s) -

Ghaleb A. Husseini,

Matthew R. Linford,

Matthew C. Asplund,

Justin G. Peacock,

Eric T. Sevy

Publication year - 2001

Publication title -

surface science spectra

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.474

H-Index - 13

eISSN - 1520-8575

pISSN - 1055-5269

DOI - 10.1116/11.20020504

Subject(s) - monolayer , silane , x ray photoelectron spectroscopy , inert gas , alkyl , silicon , inert , surface modification , materials science , solvent , wafer , chemical engineering , oxide , polymerization , silanes , silicon oxide , chemistry , polymer chemistry , organic chemistry , polymer , nanotechnology , engineering , silicon nitride

Silane monolayers on silica, prepared from mono-, di-, and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di- and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon reaction with water. Typically, an organic solvent is used when depositing a silane monolayer. Here we show XPS spectra of monolayers of 3-glycidoxypropyldimethylethoxysilane (CAS# 17963-04-1) on silicon oxide (silicon wafer) prepared using a rapid, solvent-free approach. Reaction conditions are 100 °C for 10 min using the neat (pure) compound, and no inert atmosphere or special treatment of the compound is required.

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