Open AccessMultilayer hexamethyldisiloxane film as bottom antireflective coating for ArF lithography
Author(s) -
L. A. Wang,
H. L. Chen
Publication year - 1999
Publication title -
journal of vacuum science and technology b microelectronics and nanometer structures processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 1520-8567
pISSN - 1071-1023
DOI - 10.1116/1.591062
Subject(s) - hexamethyldisiloxane , anti reflective coating , materials science , layer (electronics) , coating , electron cyclotron resonance , photolithography , chemical vapor deposition , deposition (geology) , optoelectronics , analytical chemistry (journal) , nanotechnology , plasma , chemistry , paleontology , physics , biology , quantum mechanics , chromatography , sediment
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